EOS NickelAlloy IN625 for EOS M 400-4 | 80 µm HiPro

EOS M 400-4 - 80 µm - TRL 5

Process Information Metal

This process provides high productivity with a volume rate that is 61% faster than IN625 40 µm HiPro process.

System Setup	EOS M 400-4
EOS Material set	IN625_040_080_HiProM404
Powder Product No.	9011-0022 & 9030-0023
Required Software Plan	EOS BUILD
Software Requirements	EOSPRINT 2.14 or newer EOSYSTEM 2.18 or newer
Recoater Blade	HSS (High Speed Steel)
Nozzle	EOS Aerospike Nozzle
Inert gas	Argon
Sieve	63 µm

Additional Information
Layer Thickness	80 µm
Volume Rate	up to 4 x 9.2 mm³/s

Chemical and Physical Properties of Parts

Microstructure of the Produced Parts

Defects	Thickness	Result	Number of Samples
Average Defect Percentage	40 µm	0.02 %	-

Mechanical Properties

Mechanical Properties Heat Treated

EN ISO 6892-1 Room Temperature \| 40 µm	Yield Strength [MPa]	Tensile Strength [MPa]	Elongation at Break A [%]	Reduction of Area Z [%]	Modulus of elasticity [GPa]	Number of Samples
Vertical	635	945	45	56	201	-
Horizontal	665	1005	41	52	209	-

Modulus of Elasticity according to EN ISO 6892-1 Method A, Range 1 (0.00007 1/s)

EOS NickelAlloy IN625 can be used for many applications in the stress relieved condition, which is typically performed at 870 °C (1 600 °F). Note that this heat treatment does not solutionise the alloy.

Step 1:
Stress relieve at 870 °C (1 600 °F) for 1 hour followed by rapid cooling.