Process Data Sheet

EOS Titanium Ti64 for EOS M4 ONYX | 60 µm

EOS M4 ONYX - 60 µm - TRL 5

Process Information Metal

The M 4 ONYX Ti64 60 µm process combines significant productivity gains, excellent surface finish, and exceptional cleanliness, making it ideal for demanding titanium applications. 
Key innovations include optimized scanning strategies and exposure techniques that dramatically reduce non-productive movements, enabling faster builds with outstanding quality.

Highlights: 

  • Outstanding surface quality: Sa values < 15 µm down to 25°.
  • Improved buildability: Down to 20°/25° without support. 

 

System Setup EOS M4 ONYX
Required Software Plan EOS BUILD
Software Requirements

EOSPRINT 2.24 or newer

Recoater Blade Nitrile Butadiene Rubber (NBR)
Inert gas Argon
Sieve 63 µm
Additional Information
Layer Thickness 60 µm
Volume Rate 10 mm³/s
Min. Wall Thickness 0.12 mm

Microstructure of the Produced Parts

Defects Thickness Result Number of Samples
Average Defect Percentage 60 µm < 0.005 % -

Mechanical Properties

Mechanical Properties Heat Treated

EN ISO 6892-1 Room Temperature | 60 µm Yield Strength [MPa] Tensile Strength [MPa] Elongation at Break A [%] Reduction of Area Z [%] Modulus of elasticity [GPa] Number of Samples
Vertical 1010 1080 15 58 120 -
Horizontal 985 1075 13.5 54 116 -

Specimens were heat treated at 800 °C for 2 hours in argon inert atmosphere.

Mechanical Properties As Manufactured

EN ISO 6892-1 Room Temperature | 60 µm Yield Strength [MPa] Tensile Strength [MPa] Elongation at Break A [%] Reduction of Area Z [%] Modulus of elasticity [GPa] Number of Samples
Vertical 1160 1300 8.8 - 115 -
Horizontal 1110 1285 6.9 - 113 -

Hardness

EN ISO 6507 As Manufactured
Value 345
Unit HV 5

Surface Roughness

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